Surface Science

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IGMA Surface Science is a specialized company in the field of material research with the focus on the development and production of instruments for UHV SPM and Electron Spectroscopy.

The majority of the team consists of physicists and engineers with more than 200 years of joint experience in this field.

Our long term relationship and cooperation with leading researchers from science and industry allows to design and build instruments to meet current and future needs for nanoscience research.

The expertise in our team enables us to provide custom tailored solutions at the highest standard and best performance for our customers.

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ocus has a highly trained and motivated team of physicists and engineers in cooperation with external partners ensures that their products always meet the latest demands of science and high-tech branches. long-term.

A series of patents and the continuous development of all products guarantee and maintain the competitive advantage of the company. All products are developed, manufactured and tested internally.

Ion Sources

Ion Source FDG 15

The high performance fine focus ion source FDG 150 got now a ”little sister”, the differentially pumped ion source FDG 15.

Uses the same proven beam generation as the FDG 150 and can be used as a substitute for all applications where e.g. the wide spread but no longer available ISE 10 (Leybold/Kremer/OMICRON) has been used in the past.

In addition the FDG 15 comes with a more flexible ion optics to adjust for longer working distances and an optional ion flux stabilization.

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Ion Source FDG 150

The FDG 150 is an universal UHV Ion Source for depth profile analysis with XPS and Auger Spectroscopy, for sample cleaning, for sensor cleaning in scanning probe microscopes and for charge neutralisation (ESCA). It can also be used as excitation source with ISS/LEIS instruments.

The source is differentially pumped, comes with an integrated port aligner, a regulated leak valve and allows for large working distances.

The power supply offers an integrated scan generator for beam positioning and beam scanning. Furthermore it provides a closed loop regulation of the beam current by controlling of the integrated leak valve.

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Photon Sources

High Intensity VUV Source HIS13

The VUV source HIS 13 is a windowless gas discharge light source for the production of VUV light under vacuum conditions.

It can be operated with various discharge gases, such as helium, neon, argon, krypton, xenon or hydrogen. In many applications it is operated with helium in the He I mode delivering a very narrow (1…3meV) emission line at 21.2 eV (584nm) that is commonly used for standard UPS. The pressure rise in the UHV analysis chamber during operation can be below 10-9 mbar.

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HIS 14 HD: Focused High Density VUV Source

Designed for ultraviolet photoelectron spectroscopy on solids with the discharge lines of HeI and HeII as well as of other noble gases and hydrogen, the HIS 14 HD is an extended version of the well established FOCUS HIS 13. The small spot of 300 μm makes the HIS 14 HD ideal for ARPES or PEEM applications where high flux densities into a small area are mandatory.

Features: Robust water cooled design with direct-sight connection between the discharge area and the target for easy alignment. A port aligner facilitates the positioning of the light spot on the sample in a range of +/- 3°. For dedicated ARPES experiments there is an optional third pumping stage available for operation in the 10-10 mbar range.

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Monochromatic High Density VUV Source HIS 14 HD Mono

The HIS 14 HD Mono has been designed for ultraviolet photoelectron spectroscopy on solids with the monochromatic discharge lines of He I and He II. Together with the small spot of 300 μm the HIS 14 HD Mono is the best choice for ARPES or PEEM applications where high flux densities into a small area are mandatory.
Features: Robust water cooled design with direct-sight connection between the discharge area and the target for easy alignment. A port aligner facilitates the positioning of the light spot on the sample in a range of +/- 3°. For dedicated ARPES experiments there is an optional third pumping stage available for operation in the 10-10 range.

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