dvanced Energy is a global leader in innovative power and control technologies for high-growth, precision power conversion solutions.
Systems from Advanced Energy help thin-film manufacturing companies and R&D institutes, from all over the world, propel their growth and innovation.
Their power products offer:
- Unrivaled power plasma control.
- Unmatched DC and RF arc handling.
- Cutting-edge impedence-matching technology.
- Leading energy delivery solutions, integrated and tested in the field.
Their products are used for:
- RF cleaning
- Metal and dielectric etching
- Photoresist ashing
- Chemical vapor deposition: (CVD) / Plasma-enhanced chemical (PECVD)
- Physical vapor deposition (PVD)
- Sputter deposition
DC POWER SOURCES
Straight DC sputtering, using a DC power supply to power a magnetron, is the simplest and cheapest of the sputtering techniques. Compared to the other methods, it gives the highest sputtering rate and reasonable film quality. However, it can only be used with conducting targets.
Typical applications for DC sputtering include:
Semiconductor (copper, aluminium, tantalum, titanium, and newer exotic materials)
Flat panel display (thin-film transistor, color filter, organic LEDs)
Data storage (optical storage, magnetic storage, and combinations of magneto-optical storage)
Solar photovoltaic cell (transparent conductive oxides and Si deposition)
Architectural glass
Advanced product applications (thin films for optics, tool coating, plastics, etc.)
Pinnacle® Diamond™
Water-cooled power conversion and control systems
Range: 8 to 15 kW
MDX 1 kW & 1.5 kW
Air-cooled power conversion and control systems
Range: 1,0 to 1,5 kW
AC POWER SYSTEMS
Low- and mid-frequency power supplies from Advanced Energy offer highly efficient, easy-to-integrate power for improved process control in a wide variety of vacuum deposition applications.
Mid-Frequency PDX ®
Low power (1250 and 1400 W) and high power (5000 and 8000 W) power supplies.
Low-Frequency PEII
Modulation power supplies by pulse width of 40 kHz (PWM) with outputs up to 60 kW.
LFGS RF Generators
Power supplies: Variable frequency generator (1250 W, 40 to 500 kHz).
ASCENT® DMS
New!The Ascent DMS MF-120 package now offers a cost-effective average frequency power for standard cathodes, while offering benefits of bipolar pulse technology..
RF POWER SYSTEMS AND MATCHING UNITS
Sputtering using an RF power supply has the advantage that it can be used for insulating as well as conducting targets. It also gives much higher film quality when compared to straight DC sputtering. However, the sputtering rate is low (around 20% that of straight DC) and the equipment cost is higher as a matching unit is needed as well as an RF power supply.
Click on the links (right side) for more details or access the section on the Advanced Energy website
Our RF generators and power supply systems, together with our Matching Networks, perform extraordinarily well in plasma-based thin film manufacturing processes.
- Paramount ® RF Power-Delivery Systems
- Apex ® RF Power-Delivery Systems
- HFV ® Variable Frequency (~2 MHz) Generators
- Cesar ® generadores de RF
- HiLight ™ RF Generators
- Integro ™ RF Generators
- Ovation ® VHF Power-Management Systems
- Navigator ® II Digital Matching Network
- Navio ™ Digital Matching Network
- GenCal ™ RF Instrumentation
- RF Cables and Accessories
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