Oxford Instruments Plasma Technology have updated their Brochures for ALD and ALE (Atomic Layer Deposition and Atomic Layer Etching in English).
Brochures for ALD and ALE
ALD Technique (Atomic Layer Deposition)
ALD is a technique for the deposition of precisely controlled ultra-thin films for advanced applications on the nanometre scale, with conformal coating into high aspect ratio structures.
Highlights
– Self-limiting atomic layer-by-layer growth
– Highly conformal coating
– Pin-hole and particle free deposition
– Low plasma damage
– Low-temperature ALD processes
– Reduced nucleation delay
– Wide range of materials
ALE Technique (Atomic Layer Etching)
ALE allows the accurate removal of material one atomic layer at a time; a level of control unachievable using conventional etching.
Highlights
– Ultra low damage
– High selectivity
– Ultra accurate depth control
– Ultra low power operation
– Ability to etch in ALE or normal etch mode
